We report the development of a new microstereophotolithography technique for creation of three-dimensional microcomponents by use of a planar, layer-by-layer process of exposure, in which a spatial light modulator is used as a dynamic lithographic mask. The system operates in the UV to take advantage of the wide supply of commercially available photopolymers designed for conventional stereolithography. With this novel procedure it is possible to build components with feature sizes as small as a few micrometers. The experimental setup is briefly described, and the first microcomponent fabricated by this system is shown.
© 1999 Optical Society of America
Maria Farsari, Shiping Huang, Phil Birch, Frédéric Claret-Tournier, Rupert Young, David Budgett, Chris Bradfield, and Chris Chatwin, "Microfabrication by use of a spatial light modulator in the ultraviolet: experimental results," Opt. Lett. 24, 549-550 (1999)