Athermal silica-based interferometer-type planar light-wave circuits realized by a multicore fabrication method
Optics Letters, Vol. 28, Issue 12, pp. 1046-1048 (2003)
http://dx.doi.org/10.1364/OL.28.001046
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Abstract
Athermal silica-based interferometer-type planar light-wave circuits were realized by a newly developed multicore fabrication method. In this method, inductively coupled plasma-enhanced chemical-vapor deposition and polishing technologies are adopted on a silica substrate with a trench-type waveguide pattern prepared by reactive ion etching. Two kinds of deposited core material, 10GeO2–90SiO2 (mol. %) and 8GeO2–5B2O3–87SiO2 (mol. %), which show wavelength temperature dependence of 9.7 and 8.1 pm/°C, respectively, were used to prepare the waveguide sections in a device. By adjustment of the lengths of waveguide sections with these two different core materials, athermal characteristics of less than 0.5 pm/°C were achieved for Mach–Zehnder interferometer filter devices at the 1.55-μm wavelength range while the temperature varied from -20 to 80 °C. The new method is also applicable for the preparation of many other kinds of functional devices.
© 2003 Optical Society of America
[Optical Society of America ]
OCIS Codes
(160.6030) Materials : Silica
(220.4610) Optical design and fabrication : Optical fabrication
(230.3120) Optical devices : Integrated optics devices
(230.7390) Optical devices : Waveguides, planar
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
Citation
Liping Zuo, Hisanori Suzuki, Kenneth Kong, Junjie Si, Minyt Minyt Aye, Atsushi Watabe, and Shiro Takahashi, "Athermal silica-based interferometer-type planar light-wave circuits realized by a multicore fabrication method," Opt. Lett. 28, 1046-1048 (2003)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-28-12-1046
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