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  • Vol. 28, Iss. 16 — Aug. 15, 2003
  • pp: 1478–1480

High-resolution spectrum of xenon ions at 13.4 nm

Sergei Churilov, *Yogi N. Joshi, and †Joseph Reader  »View Author Affiliations


Optics Letters, Vol. 28, Issue 16, pp. 1478-1480 (2003)
http://dx.doi.org/10.1364/OL.28.001478


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Abstract

The spectrum of xenon excited in a low-inductance vacuum spark was photographed at high resolution in the region of 9.5–15.5 nm. The observed transitions were identified as belonging to ions from Xe<sup>8+</sup> to Xe<sup>13+</sup> . In the region of importance for extreme-ultraviolet lithography around 13.4 nm, the strongest lines were identified as 4<i>d</i><sup>8</sup>–4<i>d</i><sup>7</sup>5<i>p</i> transitions in Xe<sup>10+</sup> . The identifications were made by use of energy parameters extrapolated along the isoelectronic sequence.

© 2003 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(260.7200) Physical optics : Ultraviolet, extreme
(300.6210) Spectroscopy : Spectroscopy, atomic
(300.6320) Spectroscopy : Spectroscopy, high-resolution
(300.6540) Spectroscopy : Spectroscopy, ultraviolet

Citation
Sergei Churilov, *Yogi N. Joshi, and †Joseph Reader, "High-resolution spectrum of xenon ions at 13.4 nm," Opt. Lett. 28, 1478-1480 (2003)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-28-16-1478


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