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Optics Letters

Optics Letters


  • Vol. 28, Iss. 9 — May. 1, 2003
  • pp: 677–679

In situ technique for measuring the orthogonality of a plane wave to a substrate

Marc Châteauneuf, Michael H. Ayliffe, and Andrew G. Kirk  »View Author Affiliations

Optics Letters, Vol. 28, Issue 9, pp. 677-679 (2003)

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A new compact in situ method of measuring the perpendicularity of a plane wave to a substrate is proposed. Off-axis cylindrical Fresnel lenses are used to focus a portion of the incident plane wave onto target lines. The displacement of the focal line from the targets is determined by the degree of angular misalignment. The proposed design has been incorporated into a 10-mm-thick fused-silica module, which enables us to obtain an alignment precision of better than 0.0083°. This method is designed for use in optical assembly procedures that require an incident collimated beam that is normal to the alignment features. Experimental results are presented.

© 2003 Optical Society of America

OCIS Codes
(050.1220) Diffraction and gratings : Apertures
(050.1380) Diffraction and gratings : Binary optics
(050.1950) Diffraction and gratings : Diffraction gratings
(120.4290) Instrumentation, measurement, and metrology : Nondestructive testing
(120.4820) Instrumentation, measurement, and metrology : Optical systems

Marc Châteauneuf, Michael H. Ayliffe, and Andrew G. Kirk, "In situ technique for measuring the orthogonality of a plane wave to a substrate," Opt. Lett. 28, 677-679 (2003)

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  1. F. A. P. Tooley, IEEE J. Sel. Topics Quantum Electron. 2, 3 (1996).
  2. M. H. Ayliffe, M. Châteauneuf, D. R. Rolston, A. G. Kirk, and D. V. Plant, Appl. Opt. 40, 6515 (2001).
  3. B. Robertson, Y. Liu, G. C. Boisset, M. R. Taghizadeh, D. V. Plant, Appl. Opt. 36, 9253 (1997).
  4. M. Châteauneuf, A. G. Kirk, D. V. Plant, T. Yamamoto, and J. A. Ahearn, Appl. Opt. 41, 5552 (2002).
  5. F. Lacroix, B. Robertson, M. H. Ayliffe, E. Bernier, F. A. P. Tooley, M. Châteauneuf, D. V. Plant, and A. G. Kirk, Proc. SPIE 3490, 107 (1998).

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