Polarization-selective etching in femtosecond laser-assisted microfluidic channel fabrication in fused silica
Optics Letters, Vol. 30, Issue 14, pp. 1867-1869 (2005)
http://dx.doi.org/10.1364/OL.30.001867
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Abstract
We fabricate microchannels in fused silica by femtosecond laser irradiation followed by etching in diluted hydrofluoric acid. We show a dramatic dependence of the etch rate on the laser polarization, spanning 2 orders of magnitude. We establish the existence of an energy-per-pulse threshold at which etching of the laser-modified zones becomes highly polarization selective. The enhanced selective etching is due to long-range, periodic, polarization-dependent nanostructures formed in the laser-modified material.
© 2005 Optical Society of America
OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(230.3990) Optical devices : Micro-optical devices
(230.4000) Optical devices : Microstructure fabrication
Citation
C. Hnatovsky, R. S. Taylor, E. Simova, V. R. Bhardwaj, D. M. Rayner, and P. B. Corkum, "Polarization-selective etching in femtosecond laser-assisted microfluidic channel fabrication in fused silica," Opt. Lett. 30, 1867-1869 (2005)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-30-14-1867
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