Abstract

The effects of repeating thickness periods on stress are studied in $\mathrm{Zr}{\mathrm{O}}_2∕\mathrm{Si}{\mathrm{O}}_2$ multilayers deposited by electron-beam evaporation on BK7 glass and fused-silica substrates. The results show that the residual stress is compressive and decreases with an increase of the periods of repeating thickness in the $\mathrm{Zr}{\mathrm{O}}_2∕\mathrm{Si}{\mathrm{O}}_2$ multilayers. At the same time, the residual stress in multilayers deposited on BK7 glass is less than that of samples deposited on fused silica. The variation of the microstructure examined by x-ray diffraction shows that microscopic deformation does not correspond to macroscopic stress, which may be due to variation of the interface stress.

© 2005 Optical Society of America

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