Achromatic wave plates for optical pickup units fabricated by use of imprint lithography
Optics Letters, Vol. 30, Issue 19, pp. 2614-2616 (2005)
http://dx.doi.org/10.1364/OL.30.002614
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Abstract
We report achromatic form-birefringence wave plates for optical pickup units. Material dispersion and structure dispersion are balanced in a rigorous multilayer design. A trilayer grating using SiNx/SiOyNz/SiO2 provides easily accessible process control points and relaxed fabrication tolerance. We demonstrate precise patterning by using nanoimprint lithography on UV-curable polymers, alleviating a major fabrication challenge. The achromatic wave plates exhibit 90+/-3° retardance and >95% transmittance as measured by a Mueller matrix method at wavelengths of 640-800 nm.
© 2005 Optical Society of America
OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(210.0210) Optical data storage : Optical data storage
(220.4000) Optical design and fabrication : Microstructure fabrication
(260.0260) Physical optics : Physical optics
(310.0310) Thin films : Thin films
ToC Category:
Optical Data Storage
Citation
Xuegong Deng, Feng Liu, Jian J. Wang, Paul F. Sciortino, Jr., Lei Chen, and Xiaoming Liu, "Achromatic wave plates for optical pickup units fabricated by use of imprint lithography," Opt. Lett. 30, 2614-2616 (2005)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-30-19-2614
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