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Optics Letters

Optics Letters


  • Editor: Anthony J. Campillo
  • Vol. 31, Iss. 5 — Mar. 1, 2006
  • pp: 601–603

Very low-refractive-index optical thin films consisting of an array of Si O 2 nanorods

J.-Q. Xi, Jong Kyu Kim, E. F. Schubert, Dexian Ye, T.-M. Lu, Shawn-Yu Lin, and Jasbir S. Juneja  »View Author Affiliations

Optics Letters, Vol. 31, Issue 5, pp. 601-603 (2006)

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The refractive-index contrast in dielectric multilayer structures, optical resonators, and photonic crystals is an important figure of merit that creates a strong demand for high-quality thin films with a low refractive index. A Si O 2 nanorod layer with low refractive index of n = 1.08 , to our knowledge the lowest ever reported in thin-film materials, is grown by oblique-angle electron-beam deposition of Si O 2 . A single-pair distributed Bragg reflector employing a Si O 2 nanorod layer is demonstrated to have enhanced reflectivity, showing the great potential of low-refractive-index films for applications in photonic structures and devices.

© 2006 Optical Society of America

OCIS Codes
(160.5320) Materials : Photorefractive materials
(230.4040) Optical devices : Mirrors
(310.6860) Thin films : Thin films, optical properties

ToC Category:

Original Manuscript: October 25, 2005
Revised Manuscript: November 26, 2005
Manuscript Accepted: November 22, 2005

J.-Q. Xi, Jong Kyu Kim, E. F. Schubert, Dexian Ye, T.-M. Lu, Shawn-Yu Lin, and Jasbir S. Juneja, "Very low-refractive-index optical thin films consisting of an array of SiO2 nanorods," Opt. Lett. 31, 601-603 (2006)

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