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Optics Letters

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  • Editor: Anthony J. Campillo
  • Vol. 32, Iss. 21 — Nov. 1, 2007
  • pp: 3125–3127

Silicon nanowire grid polarizer for very deep ultraviolet fabricated from a shear-aligned diblock copolymer template

Young-Rae Hong, Koji Asakawa, Douglas H. Adamson, Paul M. Chaikin, and Richard A. Register  »View Author Affiliations


Optics Letters, Vol. 32, Issue 21, pp. 3125-3127 (2007)
http://dx.doi.org/10.1364/OL.32.003125


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Abstract

A silicon (Si) nanowire grid ultraviolet (UV) transmission polarizer has been fabricated, and its performance was measured over the visible to deep UV range. A cylinder-forming polystyrene-b-poly(hexylmethacrylate) diblock copolymer was coated onto an amorphous Si layer supported on a fused silica substrate, then shear aligned and employed as a mask for reactive-ion etching, resulting in a Si grid of 33 nm period and multi-centimeter-squared area. Due to the high plasma frequency and UV reflectance of the deposited Si, this nanowire grid was able to polarize light down into the deep UV, including 193 nm .

© 2007 Optical Society of America

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(120.7000) Instrumentation, measurement, and metrology : Transmission
(230.5440) Optical devices : Polarization-selective devices
(260.5430) Physical optics : Polarization
(220.4241) Optical design and fabrication : Nanostructure fabrication
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: August 1, 2007
Revised Manuscript: September 23, 2007
Manuscript Accepted: September 23, 2007
Published: October 22, 2007

Citation
Young-Rae Hong, Koji Asakawa, Douglas H. Adamson, Paul M. Chaikin, and Richard A. Register, "Silicon nanowire grid polarizer for very deep ultraviolet fabricated from a shear-aligned diblock copolymer template," Opt. Lett. 32, 3125-3127 (2007)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-32-21-3125


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