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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 33, Iss. 14 — Jul. 15, 2008
  • pp: 1572–1574

Fabrication of 50 nm period gratings with multilevel interference lithography

Chih-Hao Chang, Y. Zhao, R. K. Heilmann, and M. L. Schattenburg  »View Author Affiliations

Optics Letters, Vol. 33, Issue 14, pp. 1572-1574 (2008)

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We have developed a multilevel interference lithography process to fabricate 50 nm period gratings using light with a 351.1 nm wavelength. In this process multiple grating levels patterned by interference lithography are overlaid and spatial–phase aligned to a common reference grating using interferometry. Each grating level is patterned with offset phase shifts and etched into a single layer to achieve spatial-frequency multiplication. The effect of the multilayer periodic structure on interference lithography is examined to optimize the fabrication process. This process presents a general scheme for overlaying periodic structures and can be used to fabricate more complex periodic structures.

© 2008 Optical Society of America

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(110.4235) Imaging systems : Nanolithography
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Diffraction and Gratings

Original Manuscript: April 24, 2008
Revised Manuscript: June 4, 2008
Manuscript Accepted: June 5, 2008
Published: July 10, 2008

Chih-Hao Chang, Y. Zhao, R. K. Heilmann, and M. L. Schattenburg, "Fabrication of 50 nm period gratings with multilevel interference lithography," Opt. Lett. 33, 1572-1574 (2008)

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