Abstract

An infrared (IR) polarizer with tungsten silicide (WSi) wire grid was fabricated by two-beam interference exposure and reactive ion etching. To enhance TM transmittance, silicon monoxide was deposited between the WSi wire grid ($400\mathrm{nm}$ period) and a Si substrate. The transmittance was over 80% in the $4–5\mu \mathrm{m}$ wavelength range. The ratio of TM and TE transmittances was over 100 $\left(20\mathrm{dB}\right)$ in the $2.5–6\mu \mathrm{m}$ wavelength range. The fabricated polarizer has higher durability and bettter compatibility with microfabrication processes compared with conventional IR polarizers.

© 2008 Optical Society of America

Modeling, fabrication, and characterization of tungsten silicide wire-grid polarizer in infrared region

Itsunari Yamada, Junji Nishii, and Mitsunori Saito
Appl. Opt. 47(26) 4735-4738 (2008)

Infrared wire-grid polarizer with Y₂O₃ ceramic substrate

Itsunari Yamada, Kouhei Fukumi, Junji Nishii, and Mitsunori Saito
Opt. Lett. 35(18) 3111-3113 (2010)

Transmittance enhancement of a wire-grid polarizer by antireflection coating

Itsunari Yamada, Kenji Kintaka, Junji Nishii, Satoshi Akioka, Yutaka Yamagishi, and Mitsunori Saito
Appl. Opt. 48(2) 316-320 (2009)

Fabrication of a mid-IR wire-grid polarizer by direct imprinting on chalcogenide glass

Itsunari Yamada, Naoto Yamashita, Kunihiko Tani, Toshihiko Einishi, Mitsunori Saito, Kouhei Fukumi, and Junji Nishii
Opt. Lett. 36(19) 3882-3884 (2011)

Wire Grid Infrared Polarizer

J. B. Young, H. A. Graham, and E. W. Peterson
Appl. Opt. 4(8) 1023-1026 (1965)