Critically coupled surface phonon-polariton excitation in silicon carbide
Optics Letters, Vol. 34, Issue 17, pp. 2667-2669 doi:10.1364/OL.34.002667
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- OCIS Codes:
- (240.5420) Optics at surfaces : Polaritons
- (160.1245) Materials : Artificially engineered materials
Optics at Surfaces
Citation
Burton Neuner III, Dmitriy Korobkin, Chris Fietz, Davy Carole, Gabriel Ferro, and Gennady Shvets, "Critically coupled surface phonon-polariton excitation in silicon carbide," Opt. Lett. 34, 2667-2669 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-17-2667
Abstract
We observe critical coupling to surface phonon-polaritons in silicon carbide by attenuated total reflection of mid-IR radiation. Reflectance measurements demonstrate critical coupling by a double scan of wavelength and incidence angle. Critical coupling occurs when prism coupling loss is equal to losses in silicon carbide and the substrate, resulting in maximal electric field enhancement.
© 2009 Optical Society of America
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History
Original Manuscript: June 2, 2009
Manuscript Accepted: July 17, 2009
Published: August 28, 2009
References
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Author Affiliations
Université Claude Bernard Lyon 1
University of Texas at Austin
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