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Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 34, Iss. 20 — Oct. 15, 2009
  • pp: 3142–3144

Effects of oxide formation around core circumference of silicon-on-oxidized-porous-silicon strip waveguides

E. J. Teo, B. Q. Xiong, Y. S. Ow, M. B.H. Breese, and A. A. Bettiol  »View Author Affiliations


Optics Letters, Vol. 34, Issue 20, pp. 3142-3144 (2009)
http://dx.doi.org/10.1364/OL.34.003142


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Abstract

We have studied the effect of oxidation on the propagation loss and surface roughness of silicon-on-oxidized-porous-silicon strip waveguides fabricated using proton-beam irradiation and electrochemical etching. A thin thermal oxide is formed around the core of the waveguide, enabling the symmetric reduction of core size and roughness on all sides. Significant loss reduction from about 10 dB cm to 1 dB cm has been obtained in TE and TM polarizations after oxidation smoothening of both the bottom and the sidewalls by 20 nm . This corresponds well with simulations using the beam-propagation method that show significant contributions from both surfaces.

© 2009 Optical Society of America

OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.7370) Optical devices : Waveguides
(290.5880) Scattering : Scattering, rough surfaces

ToC Category:
Optical Devices

History
Original Manuscript: August 7, 2009
Revised Manuscript: September 9, 2009
Manuscript Accepted: September 10, 2009
Published: October 8, 2009

Citation
E. J. Teo, B. Q. Xiong, Y. S. Ow, M. B. H. Breese, and A. A. Bettiol, "Effects of oxide formation around core circumference of silicon-on-oxidized-porous-silicon strip waveguides," Opt. Lett. 34, 3142-3144 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-20-3142


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