OSA's Digital Library

Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 34, Iss. 20 — Oct. 15, 2009
  • pp: 3142–3144

Effects of oxide formation around core circumference of silicon-on-oxidized-porous-silicon strip waveguides

E. J. Teo, B. Q. Xiong, Y. S. Ow, M. B.H. Breese, and A. A. Bettiol  »View Author Affiliations

Optics Letters, Vol. 34, Issue 20, pp. 3142-3144 (2009)

View Full Text Article

Enhanced HTML    Acrobat PDF (342 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



We have studied the effect of oxidation on the propagation loss and surface roughness of silicon-on-oxidized-porous-silicon strip waveguides fabricated using proton-beam irradiation and electrochemical etching. A thin thermal oxide is formed around the core of the waveguide, enabling the symmetric reduction of core size and roughness on all sides. Significant loss reduction from about 10 dB cm to 1 dB cm has been obtained in TE and TM polarizations after oxidation smoothening of both the bottom and the sidewalls by 20 nm . This corresponds well with simulations using the beam-propagation method that show significant contributions from both surfaces.

© 2009 Optical Society of America

OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.7370) Optical devices : Waveguides
(290.5880) Scattering : Scattering, rough surfaces

ToC Category:
Optical Devices

Original Manuscript: August 7, 2009
Revised Manuscript: September 9, 2009
Manuscript Accepted: September 10, 2009
Published: October 8, 2009

E. J. Teo, B. Q. Xiong, Y. S. Ow, M. B. H. Breese, and A. A. Bettiol, "Effects of oxide formation around core circumference of silicon-on-oxidized-porous-silicon strip waveguides," Opt. Lett. 34, 3142-3144 (2009)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. G. T. Reed and A. P. Knights, in Silicon Photonics: an Introduction (Wiley, 2004). [CrossRef]
  2. J.-P. Colinge, Silicon-on-Insulator Technology: Materials to VLSI (Kluwer Academic, 1991).
  3. M. Bruel, Electron. Lett. 31, 1201 (1995). [CrossRef]
  4. K. Imai, Solid-State Electron. 24, 150 (1981). [CrossRef]
  5. B. N. Kurdi and D. G. Hall, Opt. Lett. 13, 175 (1988). [CrossRef] [PubMed]
  6. T. W. Ang, G. T. Reed, A. Vonsovici, A. G. R. Evans, P. R. Routley, and M. R. Josey, Electron. Lett. 35, 977 (1999). [CrossRef]
  7. E. J. Teo, A. A. Bettiol, M. B. H. Breese, P. Yang, G. Z. Mashanovich, W. R. Headley, G. T. Reed, and D. J. Blackwood, Opt. Express 16, 573 (2008). [CrossRef] [PubMed]
  8. E. J. Teo, A. A. Bettiol, P. Yang, M. B. H. Breese, B. Xiong, G. Z. Mashanovich, W. R. Headley, and G. T. Reed, Opt. Lett. 34, 659 (2009). [CrossRef] [PubMed]
  9. M. B. H. Breese, F. J. T. Champeaux, E. J. Teo, A. A. Bettiol, and D. Blackwood, Phys. Rev. B 73, 035428 (2006). [CrossRef]
  10. D. Mangaiyarkarasi, Y. S. Ow, M. B. H. Breese, L. S. Fuh, and X. Tang, Opt. Express 16, 12757 (2008). [PubMed]
  11. D. E. Aspnes, Thin Solid Films 89, 249 (1982). [CrossRef]
  12. P. K. Tien, Appl. Opt. 10, 2395 (1971). [CrossRef] [PubMed]
  13. K. K. Lee, D. R. Lim, H. C. Luan, A. Agarwal, J. Foresi, and L. C. Kimerling, Appl. Phys. Lett. 77, 1617 (2000). [CrossRef]
  14. G. Lerondel, R. Romestain, and S. Barret, J. Appl. Phys. 81, 6171 (1997). [CrossRef]
  15. K. K. Lee, D. R. Lim, L. C. Kimerling, J. Shin, and F. Cerrina, Opt. Lett. 26, 1888 (2001). [CrossRef]
  16. BeamPROP by RSoft, www.rsoftdesign.com.
  17. D. Marcuse, Bell Syst. Tech. J. 48, 3187 (1969).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


Fig. 1 Fig. 2 Fig. 3
Fig. 4

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited