Abstract
We fabricated a terahertz wire-grid polarizer consisting of a micrometer-pitch Al grating on a Si substrate by photolithography and wet etching. The ratio of TM and TE transmittances (extinction ratio) was over at . At the Brewster angle of the Si substrate, the polarization transmittance of a TM wave through the fabricated polarizer exceeded 95% and the extinction ratio was over at . The fabricated polarizer has a higher extinction ratio than conventional free-standing terahertz wire-grid polarizers.
© 2009 Optical Society of America
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