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Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 34, Iss. 9 — May. 1, 2009
  • pp: 1426–1428

Ultrathin membranes in x-cut lithium niobate

Frank Schrempel, Thomas Gischkat, Holger Hartung, Thomas Höche, Ernst-Bernhard Kley, Andreas Tünnermann, and Werner Wesch  »View Author Affiliations


Optics Letters, Vol. 34, Issue 9, pp. 1426-1428 (2009)
http://dx.doi.org/10.1364/OL.34.001426


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Abstract

Ion-beam enhanced etching is used to pattern a bulk lithium niobate crystal with ultrathin membranes. By the implementation of an air gap beneath the membrane, high index contrast is achieved. A buried amorphous layer, created by irradiation with He ions, is removed by means of wet chemical etching in hydro- fluoric acid. Membranes having thicknesses down to 200 nm are fabricated. The etched air gaps and the membranes exhibit a uniform thickness over the entire etched area, and their widths can be purposefully adjusted over a wide range by choosing appropriate ion energies and fluences as well as annealing conditions.

© 2009 Optical Society of America

OCIS Codes
(130.3730) Integrated optics : Lithium niobate
(160.3730) Materials : Lithium niobate
(230.7400) Optical devices : Waveguides, slab
(310.4165) Thin films : Multilayer design
(220.4241) Optical design and fabrication : Nanostructure fabrication
(310.6845) Thin films : Thin film devices and applications

ToC Category:
Thin Films

History
Original Manuscript: February 19, 2009
Revised Manuscript: April 7, 2009
Manuscript Accepted: April 7, 2009
Published: April 28, 2009

Citation
Frank Schrempel, Thomas Gischkat, Holger Hartung, Thomas Höche, Ernst-Bernhard Kley, Andreas Tünnermann, and Werner Wesch, "Ultrathin membranes in x-cut lithium niobate," Opt. Lett. 34, 1426-1428 (2009)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-9-1426


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