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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 35, Iss. 1 — Jan. 1, 2010
  • pp: 10–12

High resistance against ultraviolet photorefraction in zirconium-doped lithium niobate crystals

Fucai Liu, Yongfa Kong, Wei Li, Hongde Liu, Shiguo Liu, Shaolin Chen, Xinzheng Zhang, Romano Rupp, and Jingjun Xu  »View Author Affiliations


Optics Letters, Vol. 35, Issue 1, pp. 10-12 (2010)
http://dx.doi.org/10.1364/OL.35.000010


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Abstract

The UV photorefraction of Zr-doped lithium niobate (LN:Zr) was investigated. The experimental results show that LN:Zr crystals have high resistance against photorefraction in the UV region as well as in the visible range and can withstand a UV light intensity of above 10 5 W cm 2 . According to the fitting results of erasing curves with UV and green light, a two-center O 2 -defect model was suggested. Our results indicate that LN:Zr is an excellent candidate for optical damage resistance from the UV to the visible spectrum.

© 2009 Optical Society of America

OCIS Codes
(160.3730) Materials : Lithium niobate
(190.5330) Nonlinear optics : Photorefractive optics

ToC Category:
Materials

History
Original Manuscript: August 27, 2009
Revised Manuscript: November 4, 2009
Manuscript Accepted: November 20, 2009
Published: December 18, 2009

Citation
Fucai Liu, Yongfa Kong, Wei Li, Hongde Liu, Shiguo Liu, Shaolin Chen, Xinzheng Zhang, Romano Rupp, and Jingjun Xu, "High resistance against ultraviolet photorefraction in zirconium-doped lithium niobate crystals," Opt. Lett. 35, 10-12 (2010)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-35-1-10

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