Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film
Optics Letters, Vol. 35, Issue 13, pp. 2143-2145 (2010)
http://dx.doi.org/10.1364/OL.35.002143
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Abstract
We propose a photolithographic method to fabricate nanostructures by employing a localized surface plasmon (LSP) mask generated by a soft mold on a thin metal film. The soft mold can be formed by transparent materials, such as polydimethylsiloxane, contacting firmly to the metal film. The pattern edges of the mold, serving as the fine tapers, can be used to excite LSPs and accumulate a large amount of localized energy from the incident light field, providing a modulated optical field in the resist with nanometer feature size. Nanolithographic results with a minimum feature size of
© 2010 Optical Society of America
OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(240.6680) Optics at surfaces : Surface plasmons
ToC Category:
Optical Design and Fabrication
History
Original Manuscript: December 3, 2009
Revised Manuscript: May 26, 2010
Manuscript Accepted: May 27, 2010
Published: June 17, 2010
Citation
Yukun Zhang, Xiaochun Dong, Jinglei Du, Xingzhan Wei, Lifang Shi, Qiling Deng, and Chunlei Du, "Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film," Opt. Lett. 35, 2143-2145 (2010)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-35-13-2143
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