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Optics Letters

Optics Letters


  • Editor: Alan E. Willner
  • Vol. 35, Iss. 14 — Jul. 15, 2010
  • pp: 2337–2339

Sub-70 nm resolution tabletop microscopy at 13.8 nm using a compact laser–plasma EUV source

Przemyslaw W. Wachulak, Andrzej Bartnik, and Henryk Fiedorowicz  »View Author Affiliations

Optics Letters, Vol. 35, Issue 14, pp. 2337-2339 (2010)

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We report the first (to our knowledge) demonstration of a tabletop, extreme UV (EUV) transmission microscope at 13.8 nm wavelength with a spatial (half-pitch) resolution of 69 nm . In the experiment, a compact laser–plasma EUV source based on a gas puff target is applied to illuminate an object. A multilayer ellipsoidal mirror is used to focus quasi-monochromatic EUV radiation onto the object, while a Fresnel zone plate objective forms the image. The experiment and the spatial resolution measurements, based on a knife-edge test, are described. The results might be useful for the realization of a compact high-resolution tabletop imaging systems for actinic defect characterization.

© 2010 Optical Society of America

OCIS Codes
(110.7440) Imaging systems : X-ray imaging
(180.7460) Microscopy : X-ray microscopy
(050.1965) Diffraction and gratings : Diffractive lenses

ToC Category:
Diffraction and Gratings

Original Manuscript: May 27, 2010
Revised Manuscript: June 9, 2010
Manuscript Accepted: June 11, 2010
Published: July 2, 2010

Przemyslaw W. Wachulak, Andrzej Bartnik, and Henryk Fiedorowicz, "Sub-70 nm resolution tabletop microscopy at 13.8 nm using a compact laser–plasma EUV source," Opt. Lett. 35, 2337-2339 (2010)

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