Three-dimensional inverted photonic grating with engineerable refractive indices for broadband antireflection of terahertz waves
Optics Letters, Vol. 35, Issue 19, pp. 3159-3161 (2010)
http://dx.doi.org/10.1364/OL.35.003159
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Abstract
Reduction of reflection is of great importance in optical spectroscopy to reduce interference and increase throughput. Here we demonstrate a three-dimensional inverted photonic grating device design using only one material—silicon. Enhanced transmission compared to planar silicon wafers is observed from
© 2010 Optical Society of America
OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(220.0220) Optical design and fabrication : Optical design and fabrication
(230.0230) Optical devices : Optical devices
(230.3990) Optical devices : Micro-optical devices
(320.0320) Ultrafast optics : Ultrafast optics
(320.7080) Ultrafast optics : Ultrafast devices
ToC Category:
Diffraction and Gratings
History
Original Manuscript: June 14, 2010
Revised Manuscript: July 28, 2010
Manuscript Accepted: August 19, 2010
Published: September 20, 2010
Citation
Yuting W. Chen, Pengyu Han, X.-C. Zhang, Mei-Ling Kuo, and Shawn-Yu Lin, "Three-dimensional inverted photonic grating with engineerable refractive indices for broadband antireflection of terahertz waves," Opt. Lett. 35, 3159-3161 (2010)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-35-19-3159
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