OSA's Digital Library

Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 35, Iss. 20 — Oct. 15, 2010
  • pp: 3450–3452

Sub-50 nm patterning by immersion interference lithography using a Littrow prism as a Lloyd’s interferometer

Johannes de Boor, Dong Sik Kim, and Volker Schmidt  »View Author Affiliations


Optics Letters, Vol. 35, Issue 20, pp. 3450-3452 (2010)
http://dx.doi.org/10.1364/OL.35.003450


View Full Text Article

Enhanced HTML    Acrobat PDF (437 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

We present a simple setup that combines immersion lithography with a Lloyd’s mirror interferometer. Aiming for smaller structure sizes, we have replaced the usual Lloyd’s interferometer by a triangular Littrow prism with one metal-coated side, which acts as a mirror. Because of the higher refractive index of the prism, the wavelength and, thus, the attainable structure sizes, are decreased significantly. Using a laser with a wavelength of 244 nm , we could produce line patterns with a period of less than 100 nm and a width of 45 nm . The introduced setup retains all the advantages of a Lloyd’s mirror interferometer, in particular the flexibility in periodicity.

© 2010 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication
(120.4640) Instrumentation, measurement, and metrology : Optical instruments
(220.4610) Optical design and fabrication : Optical fabrication
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: July 27, 2010
Revised Manuscript: September 7, 2010
Manuscript Accepted: September 7, 2010
Published: October 12, 2010

Citation
Johannes de Boor, Dong Sik Kim, and Volker Schmidt, "Sub-50 nm patterning by immersion interference lithography using a Littrow prism as a Lloyd’s interferometer," Opt. Lett. 35, 3450-3452 (2010)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-35-20-3450

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited