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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 35, Iss. 3 — Feb. 1, 2010
  • pp: 273–275

Strain dependence of second-harmonic generation in silicon

Clemens Schriever, Christian Bohley, and Ralf B. Wehrspohn  »View Author Affiliations


Optics Letters, Vol. 35, Issue 3, pp. 273-275 (2010)
http://dx.doi.org/10.1364/OL.35.000273


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Abstract

Strained silicon is a versatile new type of material, which has found application in microelectronics and integrated optics in the last years. Unlike ordinary silicon, it does not possess a centrosymmetric lattice structure. This allows for stimulation of nonlinear optical processes that involve second-order nonlinear susceptibility. Here, the dependence of the nonlinear susceptibility on the applied strain by means of reflected second-harmonic generation is investigated. This surface-sensitive technique is suitable for the investigation of bulk silicon strained by a layer of thermal oxide. The obtained relation between applied stress and susceptibility enhancement is compared to theoretical prediction based on an analytical model for the deformed silicon orbital. The knowledge of the stress-susceptibility dependence can be used to develop suitable photonic devices that benefit from second-order nonlinear processes in silicon.

© 2010 Optical Society of America

OCIS Codes
(160.4330) Materials : Nonlinear optical materials
(190.4350) Nonlinear optics : Nonlinear optics at surfaces
(190.4720) Nonlinear optics : Optical nonlinearities of condensed matter
(240.4350) Optics at surfaces : Nonlinear optics at surfaces
(310.4925) Thin films : Other properties (stress, chemical, etc.)

ToC Category:
Materials

History
Original Manuscript: October 20, 2009
Revised Manuscript: December 14, 2009
Manuscript Accepted: December 16, 2009
Published: January 20, 2010

Citation
Clemens Schriever, Christian Bohley, and Ralf B. Wehrspohn, "Strain dependence of second-harmonic generation in silicon," Opt. Lett. 35, 273-275 (2010)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-35-3-273

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