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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Alan E. Willner
  • Vol. 35, Iss. 9 — May. 1, 2010
  • pp: 1404–1406

Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging

Bo Peng, Xiangzhao Wang, Zicheng Qiu, Qiongyan Yuan, and Yuting Cao  »View Author Affiliations


Optics Letters, Vol. 35, Issue 9, pp. 1404-1406 (2010)
http://dx.doi.org/10.1364/OL.35.001404


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Abstract

We discuss the aberration-induced intensity imbalance of alternating phase-shifting mask (Alt-PSM) in lithographic imaging, in contrast to numerous studies on mask-induced intensity imbalance. Based on the Hopkins theory of partial coherent imaging, a linear relationship between the intensity difference of adjacent peaks in an Alt-PSM image and even aberration is established by formulations and verified by numerical results. The application of the linear relationship is briefly discussed.

© 2010 Optical Society of America

OCIS Codes
(050.5080) Diffraction and gratings : Phase shift
(110.2960) Imaging systems : Image analysis
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography

ToC Category:
Imaging Systems

History
Original Manuscript: November 9, 2009
Revised Manuscript: March 17, 2010
Manuscript Accepted: March 22, 2010
Published: April 26, 2010

Citation
Bo Peng, Xiangzhao Wang, Zicheng Qiu, Qiongyan Yuan, and Yuting Cao, "Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging," Opt. Lett. 35, 1404-1406 (2010)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-35-9-1404

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