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Lateral shearing interferometry of high-harmonic wavefronts |
Optics Letters, Vol. 36, Issue 10, pp. 1746-1748 (2011)
http://dx.doi.org/10.1364/OL.36.001746
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Abstract
We present a technique for frequency-resolved wavefront characterization of high harmonics based on lateral shearing interferometry. Tilted replicas of the driving laser pulse are produced by a Mach–Zehnder interferometer, producing separate focii in the target. The interference of the resulting harmonics on a flat-field extreme ultraviolet spectrometer yields the spatial phase derivative. A comprehensive set of spatial profiles, resolved by harmonic order, validate the technique and reveal the interplay of single-atom and macroscopic effects.
© 2011 Optical Society of America
OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(190.2620) Nonlinear optics : Harmonic generation and mixing
(340.7450) X-ray optics : X-ray interferometry
(020.2649) Atomic and molecular physics : Strong field laser physics
ToC Category:
Instrumentation, Measurement, and Metrology
History
Original Manuscript: February 3, 2011
Revised Manuscript: March 28, 2011
Manuscript Accepted: March 31, 2011
Published: May 4, 2011
Citation
Dane R. Austin, Tobias Witting, Christopher A. Arrell, Felix Frank, Adam S. Wyatt, Jon P. Marangos, John W.G. Tisch, and Ian A. Walmsley, "Lateral shearing interferometry of high-harmonic wavefronts," Opt. Lett. 36, 1746-1748 (2011)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-36-10-1746
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