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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 36, Iss. 16 — Aug. 15, 2011
  • pp: 3269–3271

Multilayer thin-film inspection through measurements of reflection coefficients

Kai Wu, Cheng-Chung Lee, Neal J. Brock, and Brad Kimbrough  »View Author Affiliations


Optics Letters, Vol. 36, Issue 16, pp. 3269-3271 (2011)
http://dx.doi.org/10.1364/OL.36.003269


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Abstract

A vibration-insensitive interferometer is described to measure the thickness, refraction index and surface profile of thin-film stack at normal incidence. By satisfying the continuous boundary conditions of electric and magnetic fields at interfaces in a multilayer film stack, the reflection coefficient phase of the thin-film stack can be distinguished from the phase of spatial path difference, thus thickness and refraction index can be extracted. The experiment results showed that the measurement precision is significantly increased after the phase analysis was added into the reflectance analysis.

© 2011 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(310.1620) Thin films : Interference coatings
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: June 17, 2011
Revised Manuscript: July 10, 2011
Manuscript Accepted: July 11, 2011
Published: August 15, 2011

Citation
Kai Wu, Cheng-Chung Lee, Neal J. Brock, and Brad Kimbrough, "Multilayer thin-film inspection through measurements of reflection coefficients," Opt. Lett. 36, 3269-3271 (2011)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-36-16-3269

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