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Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 37, Iss. 17 — Sep. 1, 2012
  • pp: 3633–3635

Defect-tolerant extreme ultraviolet nanoscale printing

L. Urbanski, A. Isoyan, A. Stein, J. J. Rocca, C. S. Menoni, and M. C. Marconi  »View Author Affiliations


Optics Letters, Vol. 37, Issue 17, pp. 3633-3635 (2012)
http://dx.doi.org/10.1364/OL.37.003633


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Abstract

We present a defect-free lithography method for printing periodic features with nanoscale resolution using coherent extreme ultraviolet light. This technique is based on the self-imaging effect known as the Talbot effect, which is produced when coherent light is diffracted by a periodic mask. We present a numerical simulation and an experimental verification of the method with a compact extreme ultraviolet laser. Furthermore, we explore the extent of defect tolerance by testing masks with different defect layouts. The experimental results are in good agreement with theoretical calculations.

© 2012 Optical Society of America

OCIS Codes
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(110.4235) Imaging systems : Nanolithography

ToC Category:
X-ray Optics

History
Original Manuscript: April 30, 2012
Revised Manuscript: July 10, 2012
Manuscript Accepted: July 11, 2012
Published: August 27, 2012

Citation
L. Urbanski, A. Isoyan, A. Stein, J. J. Rocca, C. S. Menoni, and M. C. Marconi, "Defect-tolerant extreme ultraviolet nanoscale printing," Opt. Lett. 37, 3633-3635 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-17-3633


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References

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