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Optics Letters

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  • Editor: Alan E. Willner
  • Vol. 37, Iss. 19 — Oct. 1, 2012
  • pp: 3966–3968

Infrared imaging using arrays of SiO2 micromechanical detectors

P. G. Datskos, N. V. Lavrik, S. R. Hunter, S. Rajic, and D. Grbovic  »View Author Affiliations


Optics Letters, Vol. 37, Issue 19, pp. 3966-3968 (2012)
http://dx.doi.org/10.1364/OL.37.003966


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Abstract

In this Letter, we describe the fabrication of an array of bimaterial detectors for infrared (IR) imaging that utilize SiO2 as a structural material. All the substrate material underneath the active area of each detector element was removed. Each detector element incorporates an optical resonant cavity layer in the IR-absorbing region of the sensing element. The simplified microfabrication process requires only four photolithographic steps with no wet etching or sacrificial layers. The thermomechanical deflection sensitivity was 7.9×103rad/K, which corresponds to a noise equivalent temperature difference (NETD) of 2.9 mK. In the present work, the array was used to capture IR images while operating at room temperature and atmospheric pressure without the need for vacuum packaging. The average measured NETD of our IR detector system was approximately 200 mK, but some sensing elements exhibited an NETD of 50 mK.

© 2012 Optical Society of America

OCIS Codes
(040.1240) Detectors : Arrays
(310.1860) Thin films : Deposition and fabrication

ToC Category:
Detectors

History
Original Manuscript: June 21, 2012
Revised Manuscript: August 13, 2012
Manuscript Accepted: August 13, 2012
Published: September 19, 2012

Citation
P. G. Datskos, N. V. Lavrik, S. R. Hunter, S. Rajic, and D. Grbovic, "Infrared imaging using arrays of SiO2micromechanical detectors," Opt. Lett. 37, 3966-3968 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-19-3966


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