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Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection |
Optics Letters, Vol. 37, Issue 2, pp. 160-162 (2012)
http://dx.doi.org/10.1364/OL.37.000160
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Abstract
A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV,
© 2012 Optical Society of America
OCIS Codes
(050.5080) Diffraction and gratings : Phase shift
(230.4170) Optical devices : Multilayers
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(050.6875) Diffraction and gratings : Three-dimensional fabrication
(230.7408) Optical devices : Wavelength filtering devices
ToC Category:
Diffraction and Gratings
History
Original Manuscript: November 2, 2011
Revised Manuscript: November 18, 2011
Manuscript Accepted: November 18, 2011
Published: January 10, 2012
Citation
A. J. R. van den Boogaard, F. A. van Goor, E. Louis, and F. Bijkerk, "Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection," Opt. Lett. 37, 160-162 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-2-160
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