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Efficient second-harmonic generation in silicon nitride resonant waveguide gratings |
Optics Letters, Vol. 37, Issue 20, pp. 4269-4271 (2012)
http://dx.doi.org/10.1364/OL.37.004269
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Abstract
We demonstrate a thousand-fold enhancement of second-harmonic generation in an all-dielectric silicon nitride (SiN) resonant waveguide grating compared to a flat SiN film. The strong second-harmonic output measured at 532 nm results from the combination of the enhanced local fields in the nanostructure and the large second-order susceptibility of SiN. The second-harmonic conversion efficiency in the resonant structure is found to be of the order of
© 2012 Optical Society of America
OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(190.2620) Nonlinear optics : Harmonic generation and mixing
(050.5745) Diffraction and gratings : Resonance domain
(310.6628) Thin films : Subwavelength structures, nanostructures
ToC Category:
Diffraction and Gratings
History
Original Manuscript: May 30, 2012
Revised Manuscript: August 31, 2012
Manuscript Accepted: August 31, 2012
Published: October 11, 2012
Citation
Tingyin Ning, Henna Pietarinen, Outi Hyvärinen, Ravi Kumar, Tommi Kaplas, Martti Kauranen, and Goëry Genty, "Efficient second-harmonic generation in silicon nitride resonant waveguide gratings," Opt. Lett. 37, 4269-4271 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-20-4269
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