Deep-UV lithography using high-efficiency phase mask has been developed to print 100 nm period grating on sol-gel based thin layer. High efficiency phase mask has been designed to produce a high-contrast interferogram (periodic fringes) under water immersion conditions for 244 nm laser. The demonstration has been applied to a new developed immersion-compatible sol-gel layer. A sol-gel photoresist prepared from zirconium alkoxides caped with methacrylic acids was developed to achieve 50 nm resolution in a single step exposure. The nanostructures can be thermally annealed into ZrO2. Such route considerably simplifies the process for elaborating nanopatterned surfaces of transition metal oxides, and opens new routes for integrating materials of interest for applications in the field of photocatalysis, photovoltaic, optics, photonics or microelectronics.
© 2012 Optical Society of America
Diffraction and Gratings
Original Manuscript: August 27, 2012
Revised Manuscript: October 2, 2012
Manuscript Accepted: October 9, 2012
Published: November 7, 2012
Fabrice Stehlin, Yannick Bourgin, Arnaud Spangenberg, Yves Jourlin, Olivier Parriaux, Stéphanie Reynaud, Fernand Wieder, and Olivier Soppera, "Direct nanopatterning of 100 nm metal oxide periodic structures by Deep-UV immersion lithography," Opt. Lett. 37, 4651-4653 (2012)