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Analysis of diffuse reflectivity of a highly disordered GaN nanostructure as an antireflection coating |
Optics Letters, Vol. 37, Issue 4, pp. 611-613 (2012)
http://dx.doi.org/10.1364/OL.37.000611
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Abstract
A highly disordered GaN nanostructure was grown by using hydride vapor phase epitaxy on an Si(100) substrate, and its diffuse reflectivity was measured in the 200–1200 nm spectral range by using an integrating sphere. A modified multiple-scattering-based model successfully explained the spectral distribution of diffuse reflectivity of this highly disordered GaN nanostructure.
© 2012 Optical Society of America
OCIS Codes
(310.1210) Thin films : Antireflection coatings
(310.6860) Thin films : Thin films, optical properties
(160.4236) Materials : Nanomaterials
ToC Category:
Thin Films
History
Original Manuscript: November 16, 2011
Manuscript Accepted: January 4, 2012
Published: February 9, 2012
Citation
Hyunkyu Park and Chinkyo Kim, "Analysis of diffuse reflectivity of a highly disordered GaN nanostructure as an antireflection coating," Opt. Lett. 37, 611-613 (2012)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-37-4-611
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