Abstract
An extreme ultraviolet multilayer mirror with an integrated spectral filter for the IR range is presented and experimentally evaluated. The system consists of an IR-transparent multilayer stack which is used both as EUV-reflective coating and as a phase shift layer of the resonant IR antireflective (AR) coating. The AR coating is optimized in our particular case to suppress laser radiation at a wavelength of 10.6 μm, and a suppression of more than two orders of magnitude is demonstrated. The method allows high suppression over a large angular acceptance range, relevant for application in lithography systems.
©2012 Optical Society of America
Full Article | PDF ArticleMore Like This
V.V. Medvedev, A.J.R. van den Boogaard, R. van der Meer, A.E. Yakshin, E. Louis, V.M. Krivtsun, and F. Bijkerk
Opt. Express 21(14) 16964-16974 (2013)
W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, and V. Y. Banine
Opt. Lett. 34(23) 3680-3682 (2009)
V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk
Opt. Lett. 36(17) 3344-3346 (2011)