Add to BibSonomyAbstract
We present a new type of mid-infrared silicon-on-insulator (SOI) waveguide. The waveguide comprises a sub-wavelength lattice of holes acting as lateral cladding while at the same time allowing for the bottom oxide (BOX) removal by etching. The waveguide loss is determined at the wavelength of 3.8 μm for structures before and after being underetched using both vapor phase and liquid hydrofluoric acid (HF). A propagation loss of 3.4 dB/cm was measured for a design with a 300 nm grating period and 150 nm holes after partial removal (560 nm) of BOX by vapor phase HF etching. We also demonstrate an alternative design with 550 nm period and 450 nm holes, which allows a faster and complete removal of the BOX by liquid phase HF etching, yielding the waveguide propagation loss of 3.6 dB/cm.
© 2014 Optical Society of America
Full Article | PDF ArticleMore Like This
J. Soler Penades, A. Ortega-Moñux, M. Nedeljkovic, J. G. Wangüemert-Pérez, R. Halir, A. Z. Khokhar, C. Alonso-Ramos, Z. Qu, I. Molina-Fernández, P. Cheben, and G. Z. Mashanovich
Opt. Express 24(20) 22908-22916 (2016)
Alejandro Sánchez-Postigo, Alejandro Ortega-Moñux, Jordi Soler Penadés, Ahmed Osman, Milos Nedeljkovic, Zhibo Qu, Yangbo Wu, Íñigo Molina-Fernández, Pavel Cheben, Goran Z. Mashanovich, and J. Gonzalo Wangüemert-Pérez
Opt. Express 29(11) 16867-16878 (2021)
J. Soler Penadés, A. Sánchez-Postigo, M. Nedeljkovic, A. Ortega-Moñux, J. G. Wangüemert-Pérez, Y. Xu, R. Halir, Z. Qu, A. Z. Khokhar, A. Osman, W. Cao, C. G. Littlejohns, P. Cheben, I. Molina-Fernández, and G. Z. Mashanovich
Opt. Lett. 43(4) 795-798 (2018)