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Optics Letters

Optics Letters


  • Editor: Xi-Cheng Zhang
  • Vol. 39, Iss. 4 — Feb. 15, 2014
  • pp: 1042–1045

Pulse compression grating fabrication by diffractive proximity photolithography

Lorenz Stuerzebecher, Frank Fuchs, Torsten Harzendorf, and Uwe D. Zeitner  »View Author Affiliations

Optics Letters, Vol. 39, Issue 4, pp. 1042-1045 (2014)

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We report about a newly devised throughput-scalable fabrication method for high-quality periodic submicron structures. The process is demonstrated for optical transmission gratings in fused silica with a period of 800 nm (1250lines/mm) to be used in laser pulse compression. The technology is based on an innovative advancement of i-line proximity photolithography performed in a mask aligner. The aerial image is encoded in a rigorously optimized electron-beam-written three-level phase mask which is illuminated by an adapted multipole configuration of incidence angles. In comparison to conventional proximity lithography, the process enables a significantly higher resolution while maintaining a good depth of focus—in contrast to lithography based on direct Talbot-imaging. Details about the grating fabrication process and characterization of fabricated pulse compression grating wafers are presented. The gratings show a diffraction efficiency of 97% at a wavelength of 1030 nm and a wavefront error comparable to gratings fabricated by electron-beam lithography.

© 2014 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(220.3740) Optical design and fabrication : Lithography
(230.4000) Optical devices : Microstructure fabrication
(320.5520) Ultrafast optics : Pulse compression
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Optical Design and Fabrication

Original Manuscript: December 17, 2013
Revised Manuscript: January 10, 2014
Manuscript Accepted: January 12, 2014
Published: February 12, 2014

Lorenz Stuerzebecher, Frank Fuchs, Torsten Harzendorf, and Uwe D. Zeitner, "Pulse compression grating fabrication by diffractive proximity photolithography," Opt. Lett. 39, 1042-1045 (2014)

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