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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Editor: Xi-Cheng Zhang
  • Vol. 39, Iss. 8 — Apr. 15, 2014
  • pp: 2286–2289

Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths

Nassir Mojarad, Daniel Fan, Jens Gobrecht, and Yasin Ekinci  »View Author Affiliations


Optics Letters, Vol. 39, Issue 8, pp. 2286-2289 (2014)
http://dx.doi.org/10.1364/OL.39.002286


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Abstract

Manufacturing efficient and broadband optics is of high technological importance for various applications in all wavelength regimes. Particularly in the extreme ultraviolet and soft x-ray spectra, this becomes challenging due to the involved atomic absorption edges that rapidly change the optical constants in these ranges. Here we demonstrate a new interference lithography grating mask that can be used for nanopatterning in this spectral range. We demonstrate photolithography with cutting-edge resolution at 6.5 and 13.5 nm wavelengths, relevant to the semiconductor industry, as well as using 2.5 and 4.5 nm wavelength for patterning thick photoresists and fabricating high-aspect-ratio metal nanostructures for plasmonics and sensing applications.

© 2014 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(110.5220) Imaging systems : Photolithography
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(110.4235) Imaging systems : Nanolithography
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Imaging Systems

History
Original Manuscript: January 23, 2014
Revised Manuscript: March 14, 2014
Manuscript Accepted: March 14, 2014
Published: April 8, 2014

Citation
Nassir Mojarad, Daniel Fan, Jens Gobrecht, and Yasin Ekinci, "Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths," Opt. Lett. 39, 2286-2289 (2014)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-39-8-2286

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