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Dichroic beam splitter for extreme-ultraviolet and visible radiation

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Abstract

A simple dichroic beam splitter capable of separating extreme-ultraviolet (XUV) radiation from high-powered visible and UV laser beams is demonstrated. The device has high XUV reflection efficiency (R ≈ 44%) and high damage resistance to intense laser radiation and is therefore applicable to laser-generated XUV radiation sources, including harmonic generation, sum-frequency mixing, and anti-stokes Raman scattering.

© 1983 Optical Society of America

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