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Optics Letters

Optics Letters


  • Editor: Anthony J. Campillo
  • Vol. 32, Iss. 18 — Sep. 15, 2007
  • pp: 2650–2652

Optics InfoBase > Optics Letters > Volume 32 > Issue 18 > Ultralow-threshold Yb3+:SiO2 glass laser fabricated by the solgel process

Ultralow-threshold Yb 3 + : Si O 2 glass laser fabricated by the solgel process

Eric P. Ostby, Lan Yang, and Kerry J. Vahala  »View Author Affiliations

Optics Letters, Vol. 32, Issue 18, pp. 2650-2652 (2007)

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A Yb-doped silica microcavity laser on a silicon chip is fabricated from a solgel thin film. The high-Q microtoroid cavity, which has a finesse of 10,000, is evanescently coupled to an optical fiber taper. We report a threshold of 1.8 μ W absorbed power that is, to the best of our knowledge, the lowest published threshold to date for any Yb-doped laser. The effect of Yb 3 + concentration on laser threshold is experimentally quantified.

© 2007 Optical Society of America

OCIS Codes
(140.3070) Lasers and laser optics : Infrared and far-infrared lasers
(140.3560) Lasers and laser optics : Lasers, ring
(140.5680) Lasers and laser optics : Rare earth and transition metal solid-state lasers

ToC Category:
Lasers and Laser Optics

Original Manuscript: July 5, 2007
Manuscript Accepted: July 25, 2007
Published: September 4, 2007

Eric P. Ostby, Lan Yang, and Kerry J. Vahala, "Ultralow-threshold Yb3+:SiO2 glass laser fabricated by the solgel process," Opt. Lett. 32, 2650-2652 (2007)

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