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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 13, Iss. 1 — Jan. 1, 1988
  • pp: 7–9

In situ monitoring technique for fabrication of high-quality diffraction gratings

Yoshiaki Nakano and Kunio Tada  »View Author Affiliations


Optics Letters, Vol. 13, Issue 1, pp. 7-9 (1988)
http://dx.doi.org/10.1364/OL.13.000007


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Abstract

We describe a simple technique that permits reproducible fabrication of high-quality diffraction gratings with short periods. This technique utilizes in situ monitoring of diffracted light from photoresist gratings during the development process and provides optimum endpoint detection for this process. The effectiveness of the technique has been demonstrated through the fabrication of a distinct grating with a 255-nm period on a GaAs substrate.

© 1988 Optical Society of America

History
Original Manuscript: April 9, 1987
Manuscript Accepted: September 29, 1987
Published: January 1, 1988

Citation
Yoshiaki Nakano and Kunio Tada, "In situ monitoring technique for fabrication of high-quality diffraction gratings," Opt. Lett. 13, 7-9 (1988)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-13-1-7


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References

  1. F. H. Dill, IEEE Trans. Electron Devices ED-22, 440 (1975). [CrossRef]
  2. L. F. Johnson, G. W. Kammlott, K. A. Ingersoll, Appl. Opt. 17, 1165 (1978). [CrossRef] [PubMed]
  3. K. Tada, Y. Nakano, “Fabrication technique of semiconductor lasers,” November28, 1986, Japanese patent no. 61-282110 pending.
  4. Y. Nakano, K. Tada, Appl. Phys. Lett. 49, 1145 (1986). [CrossRef]
  5. A. Suzuki, K. Tada, Thin Solid Films 72, 419 (1980). [CrossRef]

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