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  • Vol. 14, Iss. 20 — Oct. 15, 1989
  • pp: 1113–1115

Ultrahigh-intensity KrF* laser system

T. S. Luk, A. McPherson, G. Gibson, K. Boyer, and C. K. Rhodes  »View Author Affiliations


Optics Letters, Vol. 14, Issue 20, pp. 1113-1115 (1989)
http://dx.doi.org/10.1364/OL.14.001113


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Abstract

The operational characteristics of an ultrahigh-intensity subpicosecond large-aperture KrF* laser system are described. Measurements show the achievement of a focal spot diameter of less than 1.7 μm. Combined with measurements of the pulse width and pulse energy, this yields an average intensity of ~2 × 1019 W/cm2, a value corresponding to a peak electric field of ~24 (e/a02). Light sources of this nature will find application in a broad range of studies of the nonlinear properties of matter in the strong-field regime.

© 1989 Optical Society of America

History
Original Manuscript: April 6, 1989
Manuscript Accepted: June 30, 1989
Published: October 15, 1989

Citation
T. S. Luk, A. McPherson, G. Gibson, K. Boyer, and C. K. Rhodes, "Ultrahigh-intensity KrF* laser system," Opt. Lett. 14, 1113-1115 (1989)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-14-20-1113


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References

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