We demonstrate nearly diffraction-limited printing of 0.2-μm features, using soft x rays of approximately 36-nm wavelength. An open-stencil transmission mask with minimum features of 4 μm was imaged by a twentyfold-reduction Schwarzschild-type objective onto silicon wafers coated with various e-beam resists. Implications for soft-x-ray projection lithography are discussed.
© 1990 Optical Society of America
Original Manuscript: January 2, 1990
Manuscript Accepted: March 5, 1990
Published: May 15, 1990
D. W. Berreman, J. H. Bruning, J. E. Bjorkholm, L. Eichner, R. R. Freeman, T. E. Jewell, W. M. Mansfield, A. A. MacDowell, M. L. O’Malley, E. L. Raab, W. T. Silfvast, L. H. Szeto, D. M. Tennant, W. K. Waskiewicz, D. L. White, D. L. Windt, and O. R. Wood, "Soft-x-ray projection lithography: printing of 0.2-μm features using a 20:1 reduction," Opt. Lett. 15, 529-531 (1990)