Ten-level transmission phase holograms (kinoforms) manufactured in one resist layer by electron-beam lithography are reported for the first time to our knowledge. The measured hologram diffraction efficiencies were 70% for the two resist materials used. This corresponds to 82% of the maximum theoretical value for these holograms and is, to our knowledge, the highest reported to date.
© 1990 Optical Society of America
Original Manuscript: December 29, 1989
Manuscript Accepted: March 1, 1990
Published: May 15, 1990
Mats Ekberg, Bengt Nilsson, Michael Larsson, and Sverker Hård, "Multilevel phase holograms manufactured by electron-beam lithography," Opt. Lett. 15, 568-569 (1990)