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Optics Letters

Optics Letters


  • Vol. 15, Iss. 10 — May. 15, 1990
  • pp: 568–569

Multilevel phase holograms manufactured by electron-beam lithography

Mats Ekberg, Michael Larsson, Sverker Hård, and Bengt Nilsson  »View Author Affiliations

Optics Letters, Vol. 15, Issue 10, pp. 568-569 (1990)

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Ten-level transmission phase holograms (kinoforms) manufactured in one resist layer by electron-beam lithography are reported for the first time to our knowledge. The measured hologram diffraction efficiencies were 70% for the two resist materials used. This corresponds to 82% of the maximum theoretical value for these holograms and is, to our knowledge, the highest reported to date.

© 1990 Optical Society of America

Original Manuscript: December 29, 1989
Manuscript Accepted: March 1, 1990
Published: May 15, 1990

Mats Ekberg, Bengt Nilsson, Michael Larsson, and Sverker Hård, "Multilevel phase holograms manufactured by electron-beam lithography," Opt. Lett. 15, 568-569 (1990)

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