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Optics Letters

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  • Vol. 15, Iss. 10 — May. 15, 1990
  • pp: 568–569

Multilevel phase holograms manufactured by electron-beam lithography

Mats Ekberg, Michael Larsson, Sverker Hård, and Bengt Nilsson  »View Author Affiliations


Optics Letters, Vol. 15, Issue 10, pp. 568-569 (1990)
http://dx.doi.org/10.1364/OL.15.000568


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Abstract

Ten-level transmission phase holograms (kinoforms) manufactured in one resist layer by electron-beam lithography are reported for the first time to our knowledge. The measured hologram diffraction efficiencies were 70% for the two resist materials used. This corresponds to 82% of the maximum theoretical value for these holograms and is, to our knowledge, the highest reported to date.

© 1990 Optical Society of America

History
Original Manuscript: December 29, 1989
Manuscript Accepted: March 1, 1990
Published: May 15, 1990

Citation
Mats Ekberg, Bengt Nilsson, Michael Larsson, and Sverker Hård, "Multilevel phase holograms manufactured by electron-beam lithography," Opt. Lett. 15, 568-569 (1990)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-15-10-568


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References

  1. L. F. Halle, IEEE Trans. Circuits Devices 4, 11 (1988). [CrossRef]
  2. S. M. Arnold, Opt. Eng. 24, 803 (1985).
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  7. H. Andersson, M. Ekberg, S. Hård, S. Jacobsson, M. Larsson, T. Nilsson, “Single photomask, multilevel kinoforms: manufacture and evaluation,” submitted to Appl. Opt.

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