The changes in refractive index, optical absorption, and volume of synthetic fused silica resulting from the implantation of germanium and silicon ions at energies of 3 and 5 MeV are reported. Implantation changes the density and generates ultraviolet color centers in the silica, which increases the refractive index at visible wavelengths by ∼1%. Irradiation of the implanted samples with 249-nm light from a KrF excimer laser photobleaches the color centers and reduces the index by more than 0.1%. Photobleaching is used to write a 4.3-μm pitch diffraction grating in the implanted silica.
© 1992 Optical Society of America
Original Manuscript: July 14, 1992
Published: December 1, 1992
J. Albert, J. L. Brebner, R. Leonelli, B. Malo, K. O. Hill, and D. C. Johnson, "Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching," Opt. Lett. 17, 1652-1654 (1992)