Abstract
The changes in refractive index, optical absorption, and volume of synthetic fused silica resulting from the implantation of germanium and silicon ions at energies of 3 and 5 MeV are reported. Implantation changes the density and generates ultraviolet color centers in the silica, which increases the refractive index at visible wavelengths by ∼1%. Irradiation of the implanted samples with 249-nm light from a KrF excimer laser photobleaches the color centers and reduces the index by more than 0.1%. Photobleaching is used to write a 4.3-μm pitch diffraction grating in the implanted silica.
© 1992 Optical Society of America
Full Article | PDF ArticleMore Like This
J. Albert, B. Malo, D. C. Johnson, F. Bilodeau, K.O. Hill, J. L. Brebner, and G. Kajrys
Opt. Lett. 18(14) 1126-1128 (1993)
Feng Qiu, Tadashi Narusawa, and Jie Zheng
Appl. Opt. 50(5) 733-737 (2011)
Alfio Battiato, Federico Bosia, Simone Ferrari, Paolo Olivero, Anna Sytchkova, and Ettore Vittone
Opt. Lett. 37(4) 671-673 (2012)