The fabrication of an ion-exchanged waveguide beam deflector containing a photowritten grating is described. The planar waveguide was fabricated by thermal K+ exchange in a borosilicate glass. The grating was written by photobleaching an absorption defect centered at 330 nm, which was created by γ-ray irradiation of the glass. The bleaching was accomplished with the 351-nm line from an argon laser. The device achieved 35% deflection efficiency at 633 nm, which corresponded to a grating with a photoinduced index change of 2.6 × 10−5. This is to our knowledge the first demonstration of an ion-exchanged glass waveguide device containing a permanent photowritten grating.
© 1993 Optical Society of America
Original Manuscript: November 16, 1992
Published: May 15, 1993
J. E. Roman and K. A. Winick, "Photowritten gratings in ion-exchanged glass waveguides," Opt. Lett. 18, 808-810 (1993)