Computer-generated holograms fabricated by direct write of positive electron-beam resist
Optics Letters, Vol. 18, Issue 4, pp. 308-310 (1993)
http://dx.doi.org/10.1364/OL.18.000308
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Abstract
An e-beam lithographic technique is described that produces multiple discrete phase levels as a surface-relief structure directly in positive e-beam resist. Processing techniques are presented for two positive e-beam resists: EBR-9 and polymethyl methacrylate (PMMA). This fabrication technology is experimentally applied to produce sawtooth (blazed) gratings and multiphase-level numeric-type computer-generated holograms (i.e., kinoforms).
© 1993 Optical Society of America
Citation
Kristopher S. Urquhart, Robert Stein, and Sing H. Lee, "Computer-generated holograms fabricated by direct write of positive electron-beam resist," Opt. Lett. 18, 308-310 (1993)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-18-4-308
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