An e-beam lithographic technique is described that produces multiple discrete phase levels as a surface-relief structure directly in positive e-beam resist. Processing techniques are presented for two positive e-beam resists: EBR-9 and polymethyl methacrylate (PMMA). This fabrication technology is experimentally applied to produce sawtooth (blazed) gratings and multiphase-level numeric-type computer-generated holograms (i.e., kinoforms).
© 1993 Optical Society of America
Original Manuscript: September 14, 1992
Published: February 15, 1993
Kristopher S. Urquhart, Robert Stein, and Sing H. Lee, "Computer-generated holograms fabricated by direct write of positive electron-beam resist," Opt. Lett. 18, 308-310 (1993)