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Optics Letters

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  • Vol. 18, Iss. 4 — Feb. 15, 1993
  • pp: 308–310

Computer-generated holograms fabricated by direct write of positive electron-beam resist

Kristopher S. Urquhart, Robert Stein, and Sing H. Lee  »View Author Affiliations


Optics Letters, Vol. 18, Issue 4, pp. 308-310 (1993)
http://dx.doi.org/10.1364/OL.18.000308


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Abstract

An e-beam lithographic technique is described that produces multiple discrete phase levels as a surface-relief structure directly in positive e-beam resist. Processing techniques are presented for two positive e-beam resists: EBR-9 and polymethyl methacrylate (PMMA). This fabrication technology is experimentally applied to produce sawtooth (blazed) gratings and multiphase-level numeric-type computer-generated holograms (i.e., kinoforms).

© 1993 Optical Society of America

History
Original Manuscript: September 14, 1992
Published: February 15, 1993

Citation
Kristopher S. Urquhart, Robert Stein, and Sing H. Lee, "Computer-generated holograms fabricated by direct write of positive electron-beam resist," Opt. Lett. 18, 308-310 (1993)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-18-4-308


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