A high-purity synthetic fused silica sample (Suprasil 2) was irradiated by a KrF laser at 248 nm, 300 Hz, and 500 mJ/cm2. Transmission at 248 nm, transmission at 210 nm, and fluorescence at 650 nm were monitored in real time. The sample starts out in a weakly absorbing state. Then, after several million pulses, it experiences a sudden increase in 248-nm absorption with accompanying dramatic changes in its relaxation and fluorescence behavior. Further irradiation leads to (partial) bleaching of the UV absorption.
© 1993 Optical Society of America
Original Manuscript: November 5, 1992
Published: March 15, 1993
D. J. Krajnovich, W. P. Leung, M. V. Kulkarni, I. K. Pour, and A. C. Tam, "Sudden onset of strong absorption followed by forced recovery in KrF laser-irradiated fused silica," Opt. Lett. 18, 453-455 (1993)