I develop a quantitative optimization procedure for femtosecond reflectance ellipsometer measurements. The femtosecond ellipsometer eliminates the need for separate thin-film reflectance and transmittance measurements and allows self-consistent determination of dielectric index changes of optically thick films on arbitrary substrates. I verify the optimization procedure and use the femtosecond ellipsometric measurements to investigate the photoreflectance of an optically thick gold film. A comparison of the extracted real and imaginary dielectric function components reveals evidence of thermalized and nonthermalized hot-electron populations.
© 1994 Optical Society of America
Original Manuscript: February 24, 1994
Published: August 15, 1994
Michael Y. Frankel, "Optimization of a femtosecond ellipsometer for gold photoreflectance studies," Opt. Lett. 19, 1252-1254 (1994)