Birefringence reduction in side-written photoinduced fiber devices by a dual-exposure method
Optics Letters, Vol. 19, Issue 16, pp. 1260-1262 (1994)
http://dx.doi.org/10.1364/OL.19.001260
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Abstract
An in situ birefringence measurement in conjunction with an atomic force microscope study shows that the geometric asymmetry of the side-writing process is a major cause of the induced birefringence in grating-based fiber devices. Measured refractive-index profiles of UV-exposed fibers clearly show the asymmetry in the induced index change. We demonstrate the use of a dual-exposure technique for producing low-birefringence devices.
© 1994 Optical Society of America
Citation
Ashish M. Vengsarkar, Qian Zhong, Daryl Inniss, W. A. Reed, Paul J. Lemaire, and S. G. Kosinski, "Birefringence reduction in side-written photoinduced fiber devices by a dual-exposure method," Opt. Lett. 19, 1260-1262 (1994)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-19-16-1260
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