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Optics Letters

Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 19, Iss. 16 — Aug. 15, 1994
  • pp: 1260–1262

Birefringence reduction in side-written photoinduced fiber devices by a dual-exposure method

Ashish M. Vengsarkar, Qian Zhong, Daryl Inniss, W. A. Reed, Paul J. Lemaire, and S. G. Kosinski  »View Author Affiliations


Optics Letters, Vol. 19, Issue 16, pp. 1260-1262 (1994)
http://dx.doi.org/10.1364/OL.19.001260


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Abstract

An in situ birefringence measurement in conjunction with an atomic force microscope study shows that the geometric asymmetry of the side-writing process is a major cause of the induced birefringence in grating-based fiber devices. Measured refractive-index profiles of UV-exposed fibers clearly show the asymmetry in the induced index change. We demonstrate the use of a dual-exposure technique for producing low-birefringence devices.

© 1994 Optical Society of America

History
Original Manuscript: April 29, 1994
Published: August 15, 1994

Citation
Ashish M. Vengsarkar, Qian Zhong, Daryl Inniss, W. A. Reed, Paul J. Lemaire, and S. G. Kosinski, "Birefringence reduction in side-written photoinduced fiber devices by a dual-exposure method," Opt. Lett. 19, 1260-1262 (1994)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-19-16-1260

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