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  • Vol. 19, Iss. 2 — Jan. 15, 1994
  • pp: 81–83

Laser-induced damage resistance of thin-film polarizers prepared by ion-assisted deposition

P. F. Gu and J. F. Tang  »View Author Affiliations


Optics Letters, Vol. 19, Issue 2, pp. 81-83 (1994)
http://dx.doi.org/10.1364/OL.19.000081


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Abstract

An investigation of the effects of ion-assisted deposition on the laser-induced damage threshold of thin-film polarizers has been carried out. It shows that the laser-induced damage threshold of polarizers with 50–100-eV oxygen-ion bombardment during deposition is improved considerably.

© 1994 Optical Society of America

History
Original Manuscript: July 14, 1993
Published: January 15, 1994

Citation
P. F. Gu and J. F. Tang, "Laser-induced damage resistance of thin-film polarizers prepared by ion-assisted deposition," Opt. Lett. 19, 81-83 (1994)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-19-2-81


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References

  1. P. F. Gu, J. T. Tang, Proc. Soc. Photo-Opt. Instrum. Eng. 1158, 351 (1989).
  2. P. F. Gu, Y. M. Chen, X. Q. Hu, J. F. Tang, Appl. Opt. 28, 3318 (1989). [CrossRef] [PubMed]
  3. P. F. Gu, X. Liu, J. F. Tang, Appl. Opt. 32, 1528 (1993). [CrossRef] [PubMed]
  4. H. Kuser, J. Ebert, Natl. Bur. Stand. (U.S.) Spec. Publ. 568, 269 (1980).
  5. K. H. Guenther, Appl. Opt. 23, 3743 (1984). [CrossRef] [PubMed]

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