An investigation of the effects of ion-assisted deposition on the laser-induced damage threshold of thin-film polarizers has been carried out. It shows that the laser-induced damage threshold of polarizers with 50–100-eV oxygen-ion bombardment during deposition is improved considerably.
© 1994 Optical Society of America
Original Manuscript: July 14, 1993
Published: January 15, 1994
P. F. Gu and J. F. Tang, "Laser-induced damage resistance of thin-film polarizers prepared by ion-assisted deposition," Opt. Lett. 19, 81-83 (1994)