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Optics Letters

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  • Vol. 19, Iss. 21 — Nov. 1, 1994
  • pp: 1786–1788

Si/B4C narrow-bandpass mirrors for the extreme ultraviolet

J. M. Slaughter, Brian S. Medower, R. N. Watts, C. Tarrio, T. B. Lucatorto, and Charles M. Falco  »View Author Affiliations


Optics Letters, Vol. 19, Issue 21, pp. 1786-1788 (1994)
http://dx.doi.org/10.1364/OL.19.001786


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Abstract

We report the results of extreme-ultraviolet reflectance measurements and structural characterization of multilayer mirrors made by sequential sputter deposition of Si and B4C. Compared with Si/Mo multilayers, Si/B4C have a much narrower bandpass (δλ) and better off-peak rejection but lower peak reflectance (R0). Mirrors with three different designs gave the following results: R0 = 0.275 and δλ = 0.31 nm at 13.1 nm and normal incidence; R0 = 0.34 and δλ = 1.1 nm at 18.2 nm and 45°; and R0 = 0.30 and δλ= 2.0 nm at 23.6 nm and 45°. These multilayers exhibited excellent stability on annealing at temperatures up to 600°C.

© 1994 Optical Society of America

History
Original Manuscript: June 6, 1994
Published: November 1, 1994

Citation
J. M. Slaughter, R. N. Watts, Charles M. Falco, C. Tarrio, Brian S. Medower, and T. B. Lucatorto, "Si/B4C narrow-bandpass mirrors for the extreme ultraviolet," Opt. Lett. 19, 1786-1788 (1994)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-19-21-1786


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References

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