Silicate-based glasses containing approximately 10% by weight boron or more have been observed to exhibit selective etching in hydrofluoric acid solution after direct exposure to intense visible laser light at 532 nm. The observation of a ring-shaped etch pattern in samples exposed to solid Gaussian beams suggests that selective etching is related to a charge-diffusion process rather than to local light-induced defect generation. The technique has so far resulted in the maskless production of micrometer-scale features with submicrometer depths.
© 1995 Optical Society of America
Original Manuscript: October 27, 1994
Published: February 1, 1995
E. Sauvain, Jae H. Kyung, and N. M. Lawandy, "Multiphoton micrometer-scale photoetching in silicate-based glasses," Opt. Lett. 20, 243-245 (1995)