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Optics Letters

Optics Letters

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  • Vol. 21, Iss. 17 — Sep. 1, 1996
  • pp: 1360–1362

Preparation of Bragg gratings in sputter-deposited GeO2–SiO2 glasses by excimer-laser irradiation

J. Nishii, H. Yamanaka, H. Hosono, and H. Kawazoe  »View Author Affiliations


Optics Letters, Vol. 21, Issue 17, pp. 1360-1362 (1996)
http://dx.doi.org/10.1364/OL.21.001360


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Abstract

GeO2–SiO2 thin glass films were prepared by the rf sputtering deposition method. Changes in the refractive index of −3% and in the volume of 118% were induced in the film by irradiation with excimer-laser pulses. Bragg gratings a (periodic surface-relief pattern with a sinusoidal wave) have been written in the film by irradiation through a phase mask.

© 1996 Optical Society of America

History
Original Manuscript: February 5, 1995
Published: September 1, 1996

Citation
J. Nishii, H. Hosono, H. Kawazoe, and H. Yamanaka, "Preparation of Bragg gratings in sputter-deposited GeO2–SiO2 glasses by excimer-laser irradiation," Opt. Lett. 21, 1360-1362 (1996)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-21-17-1360

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